High-performance 193-nm positive resist using alternating polymer system of functionalized cyclic olefins / maleic anhydrideDOUKI, Katsuji; KAJITA, Toru; SHIMOKAWA, Tsutomu et al.SPIE proceedings series. 2000, pp 1128-1135, isbn 0-8194-3617-8Conference Paper

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Contact hole shrink process with novel chemical shrink materialsABE, Takayoshi; KIMURA, Tooru; CHIBA, Takashi et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, 206-213Conference Paper

Deprotonation mechanism of poly(4-hydroxystyrene) and its derivativeNAKANO, Atsuro; OKAMOTO, Kazumasa; YAMAMOTO, Yukio et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 2, 1034-1039Conference Paper

A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist materialKUDO, Hiroto; WATANABE, Daisuke; NISHIKUBO, Tadatomi et al.Journal of material chemistry. 2008, Vol 18, Num 30, pp 3588-3592, issn 0959-9428, 5 p.Article

Novel developers for positive tone EUV photoresistsSHARMA, Geeta; SHARMA, Shalini; RATTNER, Michael et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190P.1-65190P.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Material design for immersion lithography with high refractive index fluid (HIF)MIYAMATSU, Takashi; YONG WANG; SHIMA, Motoyuki et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, 10-19Conference Paper

Multicomponent negative-type photoresist based on Noria analog with 12 ethoxy groupsNIINA, Nobumitsu; KUDO, Hiroto; MARUYAMA, Ken et al.Polymer journal. 2011, Vol 43, Num 4, pp 407-413, issn 0032-3896, 7 p.Article

Sub-40nm Half-Pitch Double Patterning with Resist Freezing ProcessHORI, Masafumi; NAGAI, Tomoki; SHIMOKAWA, Tsutomu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69230H.1-69230H.8, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Progress towards developing high performance immersion compatible materials and processesPETRILLO, Karen; PATEL, Kaushal; KIMMEL, Kurt et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, 52-63Conference Paper

High Refractive Index Materials Design for the Next Generation ArF Immersion LithographyFURUKAWA, Taiichi; KISHIDA, Takanori; YASUDA, Kyouyuu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692412.1-692412.8, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Low Out-Gassing Organic Spin-on HardmaskMINEGISHI, Shinya; YOSHIMURA, Nakaatsu; SATO, Mitsuo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69232X.1-69232X.9, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Various factors of the image blur in chemically amplified resistKAWAKAMI, Takanori; NAGAI, Tomoki; NISHIMURA, Yukio et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193K.1-65193K.9, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Improvement of watermark defect in immersion lithography : Mechanism of watermark defect formation and its reduction by using alkaline soluble immersion topcoatNAKAGAWA, Hiroki; NAKAMURA, Atsushi; DOUGAUCHI, Hiroshi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61531R.1-61531R.8Conference Paper

Non-chemically Amplified Resists for 193 nm LithographyNISHIMURA, Isao; HEATH, William H; MATSUMOTO, Kazuya et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69231C.1-69231C.8, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Process optimization for developer soluble immersion topcoat materialNAKAGAWA, Hiroki; GOTO, Kentarou; SHIMA, Motovuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651923.1-651923.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Comparison of single-, bi-, and tri-layer resist processNISHIMURA, Isao; ISHII, Hiroyuki; SHIMOKAWA, Tsutomu et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 2, 611-618Conference Paper

Understanding quencher mechanisms by considering photoacid -dissociation equilibrium in chemically-amplified resistsNAGAHARA, Seiji; LEI YUAN; NAKANO, Takanori et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, 338-349Conference Paper

Design and lithographic performances of 193-specific photoacid generatorsISHII, Hiroyuki; USUI, Shinji; DOUKI, Katsuji et al.SPIE proceedings series. 2000, pp 1120-1127, isbn 0-8194-3617-8Conference Paper

Double Patterning Process with Freezing TechniqueWAKAMATSU, Goji; ANNO, Yusuke; SHIMOKAWA, Tsutomu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72730B.1-72730B.8, 2Conference Paper

Dependence of Acid Generation Efficiency on Acid Molecular Structure and Concentration of Acid Generator in Chemically Amplified EUV ResistHIROSE, Ryo; KOZAWA, Takahiro; TAGAWA, Seiichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69232A.1-69232A.9, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

High performance 193nm photoresists based on fluorosulfonamideWENJIE LI; CHEN, Kuang-Jung; SUGIURA, Makoto et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190F.1-65190F.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Application of high refractive index fluid to KrF-immersion lithographyYADA, Yuji; ITO, Koji; YAMAGUCHI, Yoshikazu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61531W.1-61531W.9Conference Paper

Performance comparison of chemically amplified resists under EUV, EB and KrF exposureSHIMIZU, Daisuke; MATSUMURA, Nobuji; KAI, Toshiyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 615344.1-615344.10Conference Paper

193 SLR system based on COMA: acryl hybrid systemYAMAMOTO, Masafumi; MURATA, Kiyoshi; ISHII, Hiroyuki et al.SPIE proceedings series. 2001, pp 680-687, isbn 0-8194-4031-0, 2VolConference Paper